KLA was granted a patent for in-situ vacuum contamination measurement.

{
  "signal_id": "8ed442e3-a7b9-5009-ac8c-6fc4808b6714",
  "signal_type": "patents-company",
  "signal_subtype": "patentGrant",
  "detected_at": "2026-09-30T17:48:17+00:00",
  "company": {
    "name": "KLA",
    "domain": "kla.com"
  },
  "data": {
    "cpc": [
      {
        "code": "H10P 72/0402"
      },
      {
        "code": "H10P 72/0604"
      }
    ],
    "tags": [
      "Intellectual Property",
      "Research & Development",
      "Manufacturing Operations",
      "Quality Assurance"
    ],
    "detail": "In September 2026 KLA patented a contamination-monitoring system for semiconductor manufacturing chambers, helping identify residue without taking equipment offline.",
    "summary": "KLA was granted a patent for in-situ vacuum contamination measurement.",
    "event_at": "2026-09-29",
    "inventors": [
      {
        "name": "Santosh Kumar Sankar",
        "status": "unresolved",
        "is_primary": true
      },
      {
        "name": "Makfir Sefa",
        "status": "resolved",
        "is_primary": false,
        "linkedin_url": "https://www.linkedin.com/in/makfir-sefa"
      }
    ],
    "event_kind": "grant_date",
    "grant_date": "2026-09-29",
    "source_url": "https://patents.google.com/patent/US12751233",
    "cpc_primary": {
      "code": "H10P 72/0402"
    },
    "patent_title": "Method to perform in-situ vacuum contamination measurement and identification in arbitrarily large chambers",
    "patent_number": "US12751233",
    "uspto_assignee": "KLA Corporation",
    "patent_abstract": "The system includes a primary vacuum chamber and a secondary vacuum chamber connected to the primary vacuum chamber via a gate valve. The gate valve operates between an open position in which the secondary vacuum chamber is in fluid communication with the primary vacuum chamber and a closed position in which the secondary vacuum chamber is sealed from the primary vacuum chamber. A heat exchanger cools the secondary vacuum chamber to adsorb contaminants from the primary vacuum chamber into the secondary vacuum chamber when the gate valve is in the open position. A gas source injects a carrier gas into the secondary vacuum chamber when the gate valve is in the closed position. The heat exchanger also heats the carrier gas in the secondary vacuum chamber to desorb the contaminants into a gas sample with the carrier gas. A sample container collects the gas sample from the secondary vacuum chamber.",
    "precision_class": "structural",
    "invention_explanation": "A connected chamber is cooled to trap contaminants from the main vacuum chamber, then isolated so the captured material can be measured and identified.",
    "technologies_mentioned": [
      "vacuum systems",
      "contamination monitoring",
      "semiconductor manufacturing"
    ]
  }
}

curl https://signals.autobound.ai/v1/signals/8ed442e3-a7b9-5009-ac8c-6fc4808b6714 \
  -H "X-API-KEY: $AUTOBOUND_API_KEY"

curl -X POST https://signals.autobound.ai/v1/companies/enrich \
  -H "X-API-KEY: $AUTOBOUND_API_KEY" \
  -H "Content-Type: application/json" \
  -d '{"domain":"kla.com","limit":20}'