Abstract
A photodiode device includes a layer of semiconductor material, a plurality of pixels, each of the pixels including a diode structure on a first side of the layer of semiconductor material and a conductive layer on a second side of the layer of semiconductor material, deep trench isolation (DTI) structures isolating adjacent pixels from one another, a first vertical conductive layer over a first side of each DTI structure, and a second vertical conductive layer over a second side of each DTI structure. The first vertical conductive layer extends from the conductive layer to a first contact on the first side of each DTI structure, and the second vertical conductive layer extends from the conductive layer to a second contact on the second side of each DTI structure.