US patent US12777631
Semiconductor device and method for fabricating the same
Abstract
A semiconductor device includes: a lower structure; a first cell isolation layer and a second cell isolation layer stacked in a direction perpendicular to the lower structure and each including a void; a horizontal layer disposed between the first cell isolation layer and the second cell isolation layer; a first horizontal conductive line disposed between the first cell isolation layer and the horizontal layer, and a second horizontal conductive line disposed between the second cell isolation layer and the horizontal layer; a vertical conductive line coupled to a first side of the horizontal layer; and a data storage element including a first electrode coupled to a second side of the horizontal layer, and disposed between the first cell isolation layer and the second cell isolation layer.